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A simple program to illustrate the algorithm proposed by [1] E. Katchalski-Katzir, I. Shariv, M. Eisenstein, A. A. Friesem, C. Aflalo, and I. A. Vakser, “Molecular ...

Abstract: Mask 3D effect has been studied in the past and the main characteristic of it is that it will cause positive focus shift to the semi-dense patterns at pitches of 200 and 300 nm for as much ...